X-ray Characterization of Self-Assembled Nanoscale Dielectrics

Self-Assembled Nanoscale Dielectric (SAND) thin films are emerging as a leading contender in applications for organic and hybrid thin film transistors, allowing for low operating voltages and ideal device characteristics in next-generation flexible electronics. Dielectric properties are highly dependent on the behavior of the counter-anion within the film, specifically on their position and motion under applied electric fields. Through utilization of advanced X-ray techniques including long-period X-ray Standing Wave and X-ray Reflectivity, it is possible to locate and monitor the counteranion layer within the film. Under applied fields, the behavior of this counter-anion will reveal information that will help to optimize device properties.

Xray

Long-period X-ray Standing Wave experiment designed to locate a coherent heavy atom layer within a film overlayer.

 

Jonathan D. Emery, Young-Geun Ha, Antonio Facchetti, Tobin J. Marks, Michael J. Bedzyk

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The Materials Research Science and Engineering Center (MRSEC) is supported by the National Science Foundation under NSF Award Number DMR-0520513. Any opinions, findings and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect those of the National Science Foundation.
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