Materials Processing & Microfabrication Facility – Cleanroom

Cook Hall, 4026
Tel: (847) 491-5959

Facility Director: Bruce Wessels, MSE
Facility Manager: Dr. Anil Dhote, MSE

The Materials Research Center (MRC) cleanroom facility is devoted to materials processing, growth, device fabrication, characterization and electronic & photonic materials. The MRC cleanroom complex in Cook Hall provides microfabrication and thin film processing capabilities. Facility includes class 100 and 1000 cleanrooms. The facility provides microfabrication tools for general use by the Northwestern community, government and industrial researchers. Various techniques are available for the growth, preparation and processing of a wide range of thin film materials including in-process characterization. Training of equipment and assisted use within the MPMF is available to provide the necessary expertise.
 
This provides a centralized resource for the deposition of metal, semiconductor & dielectric thin films, photolithography, and processing. Standard microfabrication processes have been established. Available techniques include plasma enhanced chemical vapor deposition, e-beam evaporation, atomic layer deposition, reactive ion etching, photolithography, bonding, rapid thermal processing, Hall Effect Measurement and some characterization instrumentation.

EQUIPMENT:

List of Equipment Fees.

Photolithography
1. SUSS MicroTek MABA6 Mask Aligner
2. Quintel Q-4000 Mask Aligner (0.5 µ m)
3. Quintel Q-2000 Mask Aligner
4. Headway PWM32 Spinners-Programmable
5. Digital Baking Plates
6. Convection Ovens
7. Microscope
8. Photolithography Wet Bench
 
Deposition
9. Edwards Auto 500 FL400 e-beam Evaporator
10. Edwards Auto 306 e-beam Evaporator
11. Nanomaster NPE4000 Plasma Enhanced Chemical Vapor Deposition (PECVD)
12. Oxford Instruments µP80 Plasma Enhanced Chemical Vapor Deposition  (PECVD)
13. Cambridge NanoTech Savannah S100 Atomic Layer Deposition (ALD)
 
Etching
14. Samco RIE-10NR Reactive Ion Etcher (RIE)
15. Oxford Instruments µP80 Reactive Ion Etcher (RIE)
 
Characterization
16. Filmetrics F-20 Thin Film Analyzer
17. Tencore P-10 Surface Profiler
18. Metricon 2010 Prism Coupler
19. LakeShore HMS8404 Hall Effect Measurements
20. Omano Microscope
 
Processing - Bonding
21. West Bond 7374E Wedge-Wedge Wire Bonder
22. Kulicke & Soffa 4524D Ball-Ball Wire Bonder
23. Chemical Hoods
24. Annealing Tube Furnace
25. Annealsys AS-Micro Rapid Thermal Processor

 

The Materials Research Science and Engineering Center (MRSEC) is supported by the National Science Foundation under NSF Award Number DMR-1121262. Any opinions, findings and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect those of the National Science Foundation.
© 2012 Northwestern University